TY - JOUR AU - Glad, Xavier AU - Bieber, Thomas AU - de Poucques, Ludovic AU - Hugon, Robert AU - Belmahi, Mohammed AU - Vasseur, Jean-Luc AU - Bougdira, Jamal PY - 2013/03/04 Y2 - 2024/03/28 TI - Study of the chemical etching of carbon surfaces facing argon/hydrogen plasmas in a helicon type reactor JF - International Conference on Plasma Surface Engineering JA - PSE VL - 2 IS - 13 SE - Session 3 - Plasma and Ion Etching / Surface Cleaning DO - 10.3384/wcc2.6-9 UR - https://wcc.ep.liu.se/index.php/PSE/article/view/378 SP - 6-9 AB - The study of the chemical erosion by atomic hydrogen of graphite in the purpose of characterizing etching and re deposition growth kinetics is presented. Carbon samples undergo plasma treatment under different time-exposures and gas mixtures at 10 mTorr, determined as the optimal pressure. The etching outcomes are analyzed via mass loss and structure comparison (SEM, micro-Raman spectroscopy) in order to evaluate the impact of the different experimental conditions, i.e. pressure, gas mixture, RF power coupling mode and erosion duration. ER -