TY - JOUR AU - Frach, Peter AU - Gottfried, Christian AU - Fietzke, Fred AU - Klostermann, Heidrun AU - Bartzsch, Hagen AU - Gloess, Daniel PY - 2013/03/04 Y2 - 2024/03/29 TI - High Power Density Pulse Magnetron Sputtering - Process and Film Properties JF - International Conference on Plasma Surface Engineering JA - PSE VL - 2 IS - 13 SE - Session 12 - HiPIMS I DO - 10.3384/wcc2.80-83 UR - https://wcc.ep.liu.se/index.php/PSE/article/view/397 SP - 80-83 AB - In this paper specific advantages and disadvantages of different pulse magnetron sputtering processes (unipolar and bipolar pulse sputtering at high and very high power density including HIPIMS) as well as current and potential fields of application will be discussed. ER -