[1]
Itagaki, N., Oshikawa, K., Matsushima, K., Suhariadi, I., Yamashita, D., Seo, H., Kamataki, K., Uchida, G., Kamataki, K. and Shiratani, M. 2013. Crystallinity control of sputtered ZnO films by utilizing buffer layers fabricated via nitrogen mediated crystallization: Effects of nitrogen flow rate. International Conference on Plasma Surface Engineering. 2, 13 (Mar. 2013), 84–87. DOI:https://doi.org/10.3384/wcc2.84-87.