FRACH, P.; GOTTFRIED, C.; FIETZKE, F.; KLOSTERMANN, H.; BARTZSCH, H.; GLOESS, D. High Power Density Pulse Magnetron Sputtering - Process and Film Properties . International Conference on Plasma Surface Engineering, [S. l.], v. 2, n. 13, p. 80–83, 2013. DOI: 10.3384/wcc2.80-83. Disponível em: https://wcc.ep.liu.se/index.php/PSE/article/view/397. Acesso em: 21 nov. 2024.