ITAGAKI, N.; OSHIKAWA, K.; MATSUSHIMA, K.; SUHARIADI, I.; YAMASHITA, D.; SEO, H.; KAMATAKI, K.; UCHIDA, G.; KAMATAKI, K.; SHIRATANI, M. Crystallinity control of sputtered ZnO films by utilizing buffer layers fabricated via nitrogen mediated crystallization: Effects of nitrogen flow rate. International Conference on Plasma Surface Engineering, [S. l.], v. 2, n. 13, p. 84–87, 2013. DOI: 10.3384/wcc2.84-87. Disponível em: https://wcc.ep.liu.se/index.php/PSE/article/view/398. Acesso em: 23 nov. 2024.