KAWAI, S. Sensitization of Er3+ Emission in Er- and Yb-doped Si Thin Films by Laser Ablation. International Conference on Plasma Surface Engineering, [S. l.], v. 2, n. 13, p. 184–187, 2013. DOI: 10.3384/wcc2.184-187. Disponível em: https://wcc.ep.liu.se/index.php/PSE/article/view/425. Acesso em: 21 nov. 2024.