FIREK, P.; STONIO, B.; CHODUN, R.; SZMIDT, J.; ZDUNEK, K. Plasma etching of aluminum nitride thin films prepared by magnetron sputtering method. International Conference on Plasma Surface Engineering, [S. l.], v. 2, n. 13, p. 211–214, 2013. DOI: 10.3384/wcc2.211-214. Disponível em: https://wcc.ep.liu.se/index.php/PSE/article/view/432. Acesso em: 21 nov. 2024.