YAMANE, Tsukasa; NAKAO, Sachiko; TAKEUCHI, Yoshiaki; MUTA, Hiroshi; ICHIKI, Ryuta; UCHINO, Kiichiro; KAWAI, Yoshinobu. Measurements of SiH4/H2 VHF Plasma Parameters with Heated Langmuir Probe. International Conference on Plasma Surface Engineering, [S. l.], v. 2, n. 13, p. 459–462, 2013. DOI: 10.3384/wcc2.459-462. Disponível em: https://wcc.ep.liu.se/index.php/PSE/article/view/493. Acesso em: 10 apr. 2025.