TSALIKIS, D.; BAIG, C.; MAVRANTZAS, V.; AMANATIDES, E.; MATARAS, D. Hierarchical simulation of microcrystalline PECVD silicon film growth and structure. International Conference on Plasma Surface Engineering, [S. l.], v. 2, n. 13, p. 22–25, 2013. DOI: 10.3384/wcc2.22-25. Disponível em: https://wcc.ep.liu.se/index.php/PSE/article/view/382. Acesso em: 21 nov. 2024.