KONSTANTINIDIS, S. On the deposition rate during High-Power Impulse Magnetron Sputtering. . International Conference on Plasma Surface Engineering, [S. l.], v. 2, n. 13, p. 34–35, 2013. DOI: 10.3384/wcc2.34-35. Disponível em: https://wcc.ep.liu.se/index.php/PSE/article/view/385. Acesso em: 19 apr. 2024.