GOLDENBERG, E.; BURSTEIN, L.; CHAYUN-ZUCKER, I.; AVNI, R.; BOXMAN, R. L. The Effect of Nitrogen Partial Pressure and Substrate Temperature on the Characteristics of Photocatalytic N:TiO2 Thin Films deposited by Filtered Vacuum Arc Deposition. International Conference on Plasma Surface Engineering, [S. l.], v. 2, n. 13, p. 88–91, 2013. DOI: 10.3384/wcc2.88-91. Disponível em: https://wcc.ep.liu.se/index.php/PSE/article/view/399. Acesso em: 25 apr. 2024.