KOGA, K.; URAKAWA, T.; UCHIDA, G.; KAMATAKI, K.; SEO, Y.; ITAGAKI, N.; SHIRATANI, M.; SETSUHARA, Y.; SEKINE, M.; HORI, M. Control of Deposition Profile and Properties of Plasma CVD Carbon Films. International Conference on Plasma Surface Engineering, [S. l.], v. 2, n. 13, p. 136–139, 2013. DOI: 10.3384/wcc2.136-139. Disponível em: https://wcc.ep.liu.se/index.php/PSE/article/view/412. Acesso em: 28 mar. 2024.