KWIETNIEWSKI, N.; ZHANG, A.; LIM, J.-K.; BAKOWSKI, M.; SOCHACKI, M.; SZMIDT, J. Silicon carbide surface micromachining using plasma ion etching of sacrificial layer. International Conference on Plasma Surface Engineering, [S. l.], v. 2, n. 13, p. 192–194, 2013. DOI: 10.3384/wcc2.192-194. Disponível em: https://wcc.ep.liu.se/index.php/PSE/article/view/427. Acesso em: 28 mar. 2024.