SAIED, C.; CHALA, A. Characterization of Nanostructured TiN and ZrN thin films elaborated by reactive magnetron sputtering. International Conference on Plasma Surface Engineering, [S. l.], v. 2, n. 13, p. 274–278, 2013. DOI: 10.3384/wcc2.274-278. Disponível em: https://wcc.ep.liu.se/index.php/PSE/article/view/448. Acesso em: 24 apr. 2024.