ABADIAS, G.; SALADUKHIN, I. A.; UGLOV, V.; ZLOTSKI, S. V. Thermal stability of TiZrAlN films deposited by a reactive magnetron sputtering method. International Conference on Plasma Surface Engineering, [S. l.], v. 2, n. 13, p. 424–426, 2013. DOI: 10.3384/wcc2.424-426. Disponível em: https://wcc.ep.liu.se/index.php/PSE/article/view/484. Acesso em: 20 apr. 2024.