KALISZ, M.; MROCZYNSKI, R. Ultra-shallow fluorine implantation from r.f. plasma as a method for improvement of electro-physical properties of MIS structures with PECVD gate dielectric layers. International Conference on Plasma Surface Engineering, [S. l.], v. 2, n. 13, p. 467–470, 2013. DOI: 10.3384/wcc2.467-470. Disponível em: https://wcc.ep.liu.se/index.php/PSE/article/view/495. Acesso em: 18 apr. 2024.