Kalisz, M., und R. Mroczynski. „Ultra-Shallow Fluorine Implantation from r.f. Plasma As a Method for Improvement of Electro-Physical Properties of MIS Structures With PECVD Gate Dielectric Layers“. International Conference on Plasma Surface Engineering, Bd. 2, Nr. 13, März 2013, S. 467-70, doi:10.3384/wcc2.467-470.