Kwietniewski, N., A. Zhang, J.-K. Lim, M. Bakowski, M. Sochacki, and J. Szmidt. “Silicon Carbide Surface Micromachining Using Plasma Ion Etching of Sacrificial Layer”. International Conference on Plasma Surface Engineering, vol. 2, no. 13, Mar. 2013, pp. 192-4, doi:10.3384/wcc2.192-194.