Loch, Daniel A.L., and Arutiun P. Ehiasarian. “Study of the Ionisation in a Nickel Plasma by Inductively Coupled Impulse Sputtering (ICIS)”. International Conference on Plasma Surface Engineering 2, no. 13 (March 4, 2013): 108–111. Accessed November 21, 2024. https://wcc.ep.liu.se/index.php/PSE/article/view/404.