Frach P, Gottfried C, Fietzke F, Klostermann H, Bartzsch H, Gloess D. High Power Density Pulse Magnetron Sputtering - Process and Film Properties . PSE [Internet]. 2013 Mar. 4 [cited 2024 Nov. 21];2(13):80-3. Available from: https://wcc.ep.liu.se/index.php/PSE/article/view/397