Firek P, Stonio B, Chodun R, Szmidt J, Zdunek K. Plasma etching of aluminum nitride thin films prepared by magnetron sputtering method. PSE [Internet]. 2013 Mar. 4 [cited 2024 Nov. 21];2(13):211-4. Available from: https://wcc.ep.liu.se/index.php/PSE/article/view/432