Study of the chemical etching of carbon surfaces facing argon/hydrogen plasmas in a helicon type reactor

Authors

  • Xavier Glad Institut Jean Lamour, France
  • Thomas Bieber Institut Jean Lamour, France
  • Ludovic de Poucques Institut Jean Lamour, France
  • Robert Hugon Institut Jean Lamour, France
  • Mohammed Belmahi Institut Jean Lamour, France
  • Jean-Luc Vasseur Institut Jean Lamour, France
  • Jamal Bougdira Institut Jean Lamour, France

DOI:

https://doi.org/10.3384/wcc2/6-9

Abstract

The study of the chemical erosion by atomic hydrogen of graphite in the purpose of characterizing etching and re deposition growth kinetics is presented. Carbon samples undergo plasma treatment under different time-exposures and gas mixtures at 10 mTorr, determined as the optimal pressure. The etching outcomes are analyzed via mass loss and structure comparison (SEM, micro-Raman spectroscopy) in order to evaluate the impact of the different experimental conditions, i.e. pressure, gas mixture, RF power coupling mode and erosion duration.

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Published

2013-03-04

How to Cite

1.
Glad X, Bieber T, de Poucques L, Hugon R, Belmahi M, Vasseur J-L, Bougdira J. Study of the chemical etching of carbon surfaces facing argon/hydrogen plasmas in a helicon type reactor. PSE [Internet]. 2013 Mar. 4 [cited 2021 Dec. 5];2(13):6-9. Available from: https://wcc.ep.liu.se/index.php/PSE/article/view/378