Surface Interaction and Processing Using Polyatomic Cluster Ions

Authors

  • Gikan Takaoka Photonics and Electronics Science and Engineering Center, Kyoto University, Japan
  • H. Ryuto Photonics and Electronics Science and Engineering Center, Kyoto University, Japan
  • M. Takeuchi Photonics and Electronics Science and Engineering Center, Kyoto University, Japan

DOI:

https://doi.org/10.3384/wcc2/18-21

Abstract

We developed two types of polyatomic cluster ion sources, one of which was a liquid cluster ion source using organic materials with a high-vapor pressure. Vapors of liquid material such as ethanol and water were ejected through a nozzle into a vacuum region, and liquid clusters were produced by an adiabatic expansion phenomenon. Another type was a cluster ion source using ionic liquids with a relatively low-vapor pressure. Positive and negative cluster ions were produced by a high-electric field emission. In addition, the interaction of polyatomic cluster ions with solid surfaces such as Si(100), SiO2, glass, and PMMA surfaces was investigated, and chemical sputtering was predominant for the Si(100) surfaces irradiated by ethanol cluster ion beams. Also, the irradiation damage of the Si(100) surfaces by ethanol and water cluster ion beams was smaller than that by Ar monomer ion irradiation at the same acceleration voltage. With regard to surface modification, PMMA surfaces were chemically modified by water cluster irradiation. Also, glass surfaces changed to electrically conductive surfaces by ionic liquid cluster ion irradiation. Furthermore, to demonstrate engineering applications of high-rate sputtering and low-damage irradiation by ethanol cluster ion beams, micro-patterning was performed on the Si surfaces.

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Published

2013-03-04

How to Cite

1.
Takaoka G, Ryuto H, Takeuchi M. Surface Interaction and Processing Using Polyatomic Cluster Ions. PSE [Internet]. 2013 Mar. 4 [cited 2021 Dec. 9];2(13):18-21. Available from: https://wcc.ep.liu.se/index.php/PSE/article/view/381