On the deposition rate during High-Power Impulse Magnetron Sputtering.

Authors

  • Stephanos Konstantinidis Université de Mons, Belgium

DOI:

https://doi.org/10.3384/wcc2.34-35

Abstract

Not available

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Published

2013-03-04

How to Cite

1.
Konstantinidis S. On the deposition rate during High-Power Impulse Magnetron Sputtering. . PSE [Internet]. 2013 Mar. 4 [cited 2024 Dec. 22];2(13):34-5. Available from: https://wcc.ep.liu.se/index.php/PSE/article/view/385

Issue

Vol. 2 No. 13 (2012): 13th International Conference on Plasma Surface Engineering September 10 - 14, 2012, in Garmisch-Partenkirchen, Germany

Section

Session 7 - Physical Vapour Deposition II