Mechanical properties of plasma polymer films controlled by RF power
AbstractThis study deals with plasma polymer films deposited on silicon substrates using tetravinylsilane monomer. The deposition technique was plasma-enhanced chemical vapour deposition. Nanoindentation was used as a method to investigate mechanical properties of samples prepared at different RF powers. The Young’s modulus and hardness of thin films were estimated from load-displacement curves. The nanoscratch test was employed to determine the critical normal load needed for film delamination, as a parameter describing adhesion to the substrate. AFM images of scratches were carried out to correlate the data with nature and shape of scratches.
How to Cite
Palesch E, Kontarova S, Cech V. Mechanical properties of plasma polymer films controlled by RF power. PSE [Internet]. 2013 Mar. 4 [cited 2021 Dec. 9];2(13):60-3. Available from: https://wcc.ep.liu.se/index.php/PSE/article/view/392
Session 9 - Plasma CVD and Plasma Polymerization