High Power Density Pulse Magnetron Sputtering - Process and Film Properties
AbstractIn this paper specific advantages and disadvantages of different pulse magnetron sputtering processes (unipolar and bipolar pulse sputtering at high and very high power density including HIPIMS) as well as current and potential fields of application will be discussed.
How to Cite
Frach P, Gottfried C, Fietzke F, Klostermann H, Bartzsch H, Gloess D. High Power Density Pulse Magnetron Sputtering - Process and Film Properties . PSE [Internet]. 2013 Mar. 4 [cited 2021 Dec. 5];2(13):80-3. Available from: https://wcc.ep.liu.se/index.php/PSE/article/view/397
Session 12 - HiPIMS I