Control of Deposition Profile and Properties of Plasma CVD Carbon Films

Authors

  • Kazunori Koga Graduate School of Information Science and Electrical Engineering, Kyushu University, Japan
  • Tatsuya Urakawa Graduate School of Information Science and Electrical Engineering, Kyushu University, Japan
  • Giichiro Uchida Graduate School of Information Science and Electrical Engineering, Kyushu University, Japan
  • Kunihiro Kamataki Faculty of Arts and Science, Kyushu University, Japan
  • Yenwoon Seo Graduate School of Information Science and Electrical Engineering, Kyushu University, Japan
  • Nahi Itagaki Graduate School of Information Science and Electrical Engineering, Kyushu University, Japan and PRESTO, Japan Science and Technology Agency, Tokyo, Japan
  • Masaharu Shiratani Graduate School of Information Science and Electrical Engineering, Kyushu University, Japan
  • Yuuichi Setsuhara Joining and Welding Research Institute, Osaka University and CREST, Japan Science and Technology Agency, Tokyo, Japan
  • Makoto Sekine Dept. of Electrical Engineering and Computer Science, Nagoya University, Japan and CREST, Japan Science and Technology Agency, Tokyo, Japan
  • Masaru Hori Dept. of Electrical Engineering and Computer Science, Nagoya University, Japan and CREST, Japan Science and Technology Agency, Tokyo, Japan

DOI:

https://doi.org/10.3384/wcc2.136-139

Abstract

We have succeeded to deposit anisotropic and top surface deposition profile on substrates with trenches using H-assisted plasma CVD of Ar + H2 + C7H8 at a low substrate temperature of 100 oC. For the anisotropic deposition profile, carbon is deposited without being deposited on side-wall of trenches. For the top surface deposition profile, carbon is deposited at only top surface. The optical emission measurements and evaluation of deposition rate have revealed that a high flux of H atmos is the key to the deposition profile control. The mass density of the films and their Raman spectrum have shown that their structure is a-C:H.

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Published

2013-03-04

How to Cite

1.
Koga K, Urakawa T, Uchida G, Kamataki K, Seo Y, Itagaki N, Shiratani M, Setsuhara Y, Sekine M, Hori M. Control of Deposition Profile and Properties of Plasma CVD Carbon Films. PSE [Internet]. 2013 Mar. 4 [cited 2024 Apr. 18];2(13):136-9. Available from: https://wcc.ep.liu.se/index.php/PSE/article/view/412

Issue

Vol. 2 No. 13 (2012): 13th International Conference on Plasma Surface Engineering September 10 - 14, 2012, in Garmisch-Partenkirchen, Germany

Section

Session 18 - Carbon-Based Thin Films