Scaling laws governing the NF3 cleaning plasma in a large area reactor

Authors

  • G. F. Leu OC Oerlikon Solar Ltd, Truebbach, Switzerland
  • C. Goury OC Oerlikon Solar Ltd, Truebbach, Switzerland
  • P. Modrzynski OC Oerlikon Solar Ltd, Truebbach, Switzerland
  • M. Klindworth OC Oerlikon Solar Ltd, Truebbach, Switzerland
  • C. Ellert OC Oerlikon Solar Ltd, Truebbach, Switzerland

DOI:

https://doi.org/10.3384/wcc2.199-202

Abstract

An important part of the thin film Silicon PECVD technology for photovoltaic industry is the Flourine based plasma cleaning of the reactor. Precursors like CxFy, SF6, NF3 or even F2 can be used. The present paper investigates scaling laws governing the processes in NF3 plasma in a large area reactor.

Downloads

Published

2013-03-04

How to Cite

1.
Leu GF, Goury C, Modrzynski P, Klindworth M, Ellert C. Scaling laws governing the NF3 cleaning plasma in a large area reactor. PSE [Internet]. 2013 Mar. 4 [cited 2024 Nov. 21];2(13):199-202. Available from: https://wcc.ep.liu.se/index.php/PSE/article/view/429

Issue

Vol. 2 No. 13 (2012): 13th International Conference on Plasma Surface Engineering September 10 - 14, 2012, in Garmisch-Partenkirchen, Germany

Section

Poster: Plasma and ion etching / surface cleaning