Scaling laws governing the NF3 cleaning plasma in a large area reactor
AbstractAn important part of the thin film Silicon PECVD technology for photovoltaic industry is the Flourine based plasma cleaning of the reactor. Precursors like CxFy, SF6, NF3 or even F2 can be used. The present paper investigates scaling laws governing the processes in NF3 plasma in a large area reactor.
How to Cite
Leu GF, Goury C, Modrzynski P, Klindworth M, Ellert C. Scaling laws governing the NF3 cleaning plasma in a large area reactor. PSE [Internet]. 2013 Mar. 4 [cited 2021 Dec. 5];2(13):199-202. Available from: https://wcc.ep.liu.se/index.php/PSE/article/view/429
Poster: Plasma and ion etching / surface cleaning