Influence of the Ion Beam Current on Microstructures and Optical Properties of Al2O3 Thin Films by Oxygen Ion Beam Assisted Pulse Reactive Magnetron Sputtering

Authors

  • Zhimin Wang Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, China
  • Jinxiao Wang Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, China
  • Yi Wang Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, China
  • Kai Zhao Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, China
  • Xiaomei Su Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, China
  • Hu Wang Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, China
  • Yudong Feng Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, China

DOI:

https://doi.org/10.3384/wcc2.219-222

Abstract

Not available

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Published

2013-03-04

How to Cite

1.
Wang Z, Wang J, Wang Y, Zhao K, Su X, Wang H, Feng Y. Influence of the Ion Beam Current on Microstructures and Optical Properties of Al2O3 Thin Films by Oxygen Ion Beam Assisted Pulse Reactive Magnetron Sputtering. PSE [Internet]. 2013 Mar. 4 [cited 2024 Nov. 21];2(13):219-22. Available from: https://wcc.ep.liu.se/index.php/PSE/article/view/434

Issue

Vol. 2 No. 13 (2012): 13th International Conference on Plasma Surface Engineering September 10 - 14, 2012, in Garmisch-Partenkirchen, Germany

Section

Poster: Physical vapour deposition