Sn Thin Film Deposition using a Hot Refractory Anode Vacuum Arc
AbstractA Hot Refractory Anode Vacuum Arc (HRAVA) starts as cathodic arc, heating the anode and depositing on it cathode material. When the anode is hot, all deposited cathode material is reevaporated from the anode forming cleaner radially expanding plasma. It was shown that the rate of deposition reached 2-3 µm/min with significantly reduced macroparticle contamination in Sn films produced by HRAVA with current I=60–175 A and duration up to 180 s.
How to Cite
Beilis II, Koulik Y, Boxman RL. Sn Thin Film Deposition using a Hot Refractory Anode Vacuum Arc. PSE [Internet]. 2013 Mar. 4 [cited 2021 Dec. 9];2(13):231-4. Available from: https://wcc.ep.liu.se/index.php/PSE/article/view/437
Poster: Physical vapour deposition