Measurements of SiH4/H2 VHF Plasma Parameters with Heated Langmuir Probe

Autores

  • Tsukasa Yamane Solar Power Department, Mitsubishi Heavy Industries Ltd., Japan
  • Sachiko Nakao Solar Power Department, Mitsubishi Heavy Industries Ltd., Japan
  • Yoshiaki Takeuchi Solar Power Department, Mitsubishi Heavy Industries Ltd., Japan
  • Hiroshi Muta Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Japan
  • Ryuta Ichiki Department of Electrical and Electronic Engineering, Oita University, Japan
  • Kiichiro Uchino Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Japan
  • Yoshinobu Kawai Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Japan

DOI:

https://doi.org/10.3384/wcc2.459-462

Resumo

The parameters of SiH4/H2 VHF plasma were measured as a function of silane gas concentration with a heated Langmuir probe. When the sailane gas concentration was increased, the nagative ion density increased. The negative ion density was estimated from the reduction of the electron saturation current. In addition, the dependence of the sheath potential on the silane gas concentration agreed with the theoretical values derived from the Bohm sheath equation including negative ions.

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Publicado

2013-03-04

Como Citar

1.
Yamane T, Nakao S, Takeuchi Y, Muta H, Ichiki R, Uchino K, Kawai Y. Measurements of SiH4/H2 VHF Plasma Parameters with Heated Langmuir Probe. PSE [Internet]. 4º de março de 2013 [citado 3º de julho de 2024];2(13):459-62. Disponível em: https://wcc.ep.liu.se/index.php/PSE/article/view/493

Edição

v. 2 n. 13 (2012): 13th International Conference on Plasma Surface Engineering September 10 - 14, 2012, in Garmisch-Partenkirchen, Germany

Seção

Poster: Plasma diagnostics and process control