Measurements of SiH4/H2 VHF Plasma Parameters with Heated Langmuir Probe

Authors

  • Tsukasa Yamane Solar Power Department, Mitsubishi Heavy Industries Ltd., Japan
  • Sachiko Nakao Solar Power Department, Mitsubishi Heavy Industries Ltd., Japan
  • Yoshiaki Takeuchi Solar Power Department, Mitsubishi Heavy Industries Ltd., Japan
  • Hiroshi Muta Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Japan
  • Ryuta Ichiki Department of Electrical and Electronic Engineering, Oita University, Japan
  • Kiichiro Uchino Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Japan
  • Yoshinobu Kawai Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Japan

DOI:

https://doi.org/10.3384/wcc2.459-462

Abstract

The parameters of SiH4/H2 VHF plasma were measured as a function of silane gas concentration with a heated Langmuir probe. When the sailane gas concentration was increased, the nagative ion density increased. The negative ion density was estimated from the reduction of the electron saturation current. In addition, the dependence of the sheath potential on the silane gas concentration agreed with the theoretical values derived from the Bohm sheath equation including negative ions.

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Published

2013-03-04

How to Cite

1.
Yamane T, Nakao S, Takeuchi Y, Muta H, Ichiki R, Uchino K, Kawai Y. Measurements of SiH4/H2 VHF Plasma Parameters with Heated Langmuir Probe. PSE [Internet]. 2013 Mar. 4 [cited 2024 Nov. 21];2(13):459-62. Available from: https://wcc.ep.liu.se/index.php/PSE/article/view/493

Issue

Vol. 2 No. 13 (2012): 13th International Conference on Plasma Surface Engineering September 10 - 14, 2012, in Garmisch-Partenkirchen, Germany

Section

Poster: Plasma diagnostics and process control